PR removal RTP USC

Cassette type Batch plasma PR remover off line

Application:

DESCUM

Wafer cleaning

Removing residual Photoresist after wet process

Surface residue removal

Remove residual Photoresist after exposure and development

PLASMA source	RF	microwave
Power	1000w	1250w
Applicable scope	4~8寸	4~8寸
Single processing slice count	4-6 inch =50 pieces/8 inches=25 pieces	4-6 inch =50 pieces/8 inches=25 pieces
Appearance dimensions	1000x850x1700mm	1000x850x1700mm
System control	PC	PC
Automation level	Manual	Manual