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  • RIE PLASMA Photoresist Remover
RIE PLASMA Photoresist Remover

RIE PLASMA Photoresist Remover

Application:

Silicon carbide etching

Surface cleaning after etching

DESCUM

Hard mask layer, dry removal

Silicon oxide or silicon nitride etching

Removal of optical resistance between media

Surface residue removal

PLASMA source

RF

Power

ICP

_

BIAS

1000W(option)

Applicable scope

4~8 inch

Single processing slice count

1

Appearance dimensions

850mmx900mmx1850mm

System control

PLC

Automation level

Manual

导航栏目

联系我们

CONTACT US

联系人:胡顺语

手机:0086-15813334038

电话:020-84789496

邮箱:md@minder-hightech.com

地址: 广州市番禺区大龙街市新路新水坑段43号813