Advanced wafer prober

MP-H Series manual prober

MP-H6/MP-H8/MP-H12
Product description: wafer prober
INQUIRY

Product Introduction

The MP-H series probe station is suitable for R&D labora-tories, allowing them to invest their budget once.The chuck movement technology can meet your needs for efficient testing of the entire wafer.

Product Features

1.Three-stage liftable micropositioner stage for precise positioning and quick separation of probes

2.Standard metallographic microscope, Pad test above 1μm

3.Can be equipped with a laser for FA testing/laser cutting

4.Pneumatically controlled chuck movement technology for pulling out chuck quickly

Product Parameters

Manual Prober Model		MP-M4/MP-M6/MP-M6mini	MP-E4/MP-E6/MP-E8/MP-E12	MP-H6/MP-H8/MP-H12
Chuck	Chuck material	Stainless Steel/Nickel or gold plated copper
	Chuck lift	N/A	Quick rise 5mm, fine tune 6mm
	Move quickly	N/A	N/A	√
Micropositioner platform lift		N/A	N/A	Quick lift 5mm,Fine adjustment 40mm,coarse adjustment 300μm
Microscope		Standard body microscope (optional video microscope mirror), can be magnified up to 100X	Standard PSM-1000 metallographic microscope / optional (GX-6 metallographic, stereo, video) microscope,it can be magnified to 2000X，and the microscope can be adjusted up and down by air control
Probe specification	Current leakage	Coaxial 1pA/V @ 25 °C; Three shaft 100fA/V @ 25 °C; Triaxial 10pA@3kv @25°C, Test conditions: dry environment for grounding shield (air dew point lower than -40°C)
	Connector type	Banana head/Alligator clip/Coaxial/Triaxial interface
Test application		DC/(IV, CV) testing Low current (class 100fA) testing 1/f noise test Device Characterization Test WLR, aging test RF test frequency up to 110GHz High power/high current/high voltage test
		/	Failure analysis test	Failure analysis test