Testing and Environmental equipment

  • Full Spectrum Ellipsometer
Full Spectrum Ellipsometer

Full Spectrum Ellipsometer

  • MD-ELM-I
  • Product description: Full Spectrum Ellipsometer
  • INQUIRY

1. Product Overview

An ellipsometer measures the change in the polarization state of polarized light after it reflects from or transmits through a thin-film sample. It calculates the thin-film thickness based on two specific ellipsometric parameters that characterize this change: the amplitude ratio tan(Ψ) and the phase difference Δ. Since these parameters depend directly on the optical properties and thicknesses of the sample's constituent layers, ellipsometers are primarily used to measure thin-film thickness and optical constants.

The MD-ELM series consists of high-performance spectroscopic ellipsometers designed for R&D and quality control applications, covering a spectral range from ultraviolet (UV) and visible (Vis) to near-infrared (NIR).

Equipped with a high-sensitivity detection unit and specialized analysis software, the MD-ELM-I spectroscopic ellipsometer is designed to measure and analyze the structural parameters (e.g., thickness) and physical properties (e.g., refractive index *n* and extinction coefficient *k*) of multilayer nanofilms in the photovoltaic sector. Typical samples include:

1. Dielectric thin-film stacks (e.g., SiO₂/Si₃N₄multilayer films in semiconductor devices)

2. Metal and metal oxide thin films (e.g., Al₂O₃passivation layers, TiO₂optical coating layers)

3. Organic/inorganic composite thin films (e.g., perovskite films in solar cells, polymer dielectric films)

 

Figure 1 Schematic diagram of the MD-ELM-Ⅰ measurement optical path

 

2. Product Features

1. Rapid, precise spectroscopic ellipsometry measurement and analysis

2. Multi-angle of incidence measurement

3. Stepping compensator scanning mode

4. Broadband super-achromatic compensator

5. Powerful spectroscopic ellipsometry measurement and analysis software

6. User-friendly software, suitable for beginners

7. Proprietary material database and preset software applications to simplify modeling

 

3. Technical Advantages

1. Advanced RCE (Rotating Compensator Ellipsometer) measurement technology: 0–360° measurement range with no measurement dead zones;

2. High-sensitivity measurement for nano-thin films: Features advanced optical energy enhancement, high signal-to-noise ratio (SNR) detection technology, and high-SNR weak signal processing methods;

3. Multi-layer thin film inspection design: Capable of inspecting dual-layer films across various industries;

4. Rapid full-spectrum measurement: Typical full-spectrum measurement time is approximately 5 seconds (per point);

5. Sub-nanometer detection sensitivity: Measurement precision reaches 0.05 nm;

6. Adjustable multi-angle incidence: A multi-angle design enhances measurement flexibility, making it particularly suitable for complex sample measurement scenarios;

7. Signal-based sample alignment: Ensures precise sample alignment and easy observation, thereby reducing human error;

8. One-click operation: Routine tasks—including complex measurement, fitting, and analysis—can be completed with a single mouse click; an extensive model and material library also supports advanced user requirements.

 

4. Technical Specifications

4.1 Key Test Indicators

Name

Specifications

Angle of incidence

45°–90°, manually adjustable in 5° increments

Spectral range

350–1100 nm

Substrate type

Silicon-based and transparent or semi-transparent substrates

Compatible with wafer sizes up to 230 mm

Spot diameter

1–5 mm

Measurement time

0.8–3.5 s (depending on recipe settings)

Film thickness measurement range

0.1 nm–20 µm

Film thickness measurement accuracy

±0.1 nm (100 nm SiO₂ on Si standard sample)

Refractive index measurement accuracy

±0.001 (based on standard sample)

Thickness repeatability

≤0.5 Å (1-sigma standard deviation, 10 measurements on standard sample)

Refractive index repeatability (632.8 nm)

≤0.0005 (1-sigma standard deviation, 10 measurements on standard sample)

Reference standard

1 wafer,100 nm SiO₂ on Si, 4-inch

Sample focusing

Automatic focusing with visual focus signal; utilizes the same optical path as the measurement system to ensure focusing accuracy.

Software

One-touch testing capability; software upgrades and modeling are free for the lifetime of the instrument.

Number of testable film layers

≥2 layers;

Sample stage

Sample stage dimensions: ø265 mm; Z-axis adjustment range: ±5 mm;

2D tilt adjustment: ±4°; includes vacuum suction function.

Operating environment

Power supply: 220 V ±10% / 50 Hz; Power consumption: 500 W

Operating environment: Free from strong magnetic fields, vibration, and corrosive gases

Temperature: 20°C–25°C (fluctuation ≤2°C/hour)

Humidity: 30–40% RH (non-condensing)

Floor vibration: <250 micro-inches/second (1–100 Hz)

Noise level: ≤80 dB (C-weighted)

Laminar airflow: <100 feet/minute (downward flow)

 

4.2 Hardware and Software Specifications

The MD-ELM-I full-spectrum ellipsometer standard testing system comprises:

 

Light Source Module

1. Light source: 150W steady-state xenon lamp

2. Wavelength range: 200–2500 nm (enhanced output above 300 nm)

3. Service life: ≥3000 hours

4. Regulated power supply control unit: 150W; input voltage: AC 220V (±10%) / 50Hz

 

Spectral Detector

1. Detectable spectral range: 200–1100 nm

2. Back-illuminated, TE-cooled (semiconductor cooling) area-array CCD detector

3. Effective pixels: 2048 × 64

4. Configurable integration parameters

 

Mechanical Module

1. Rear-mounted optical attenuator; automatically adjusts signal saturation based on the sample being tested

2. High-precision stepper motor control

 

Software System

1. Calibration function: allows system hardware parameters to be calibrated using standard samples; simple and user-friendly operation

2. Automatic setting of optical component azimuth angles

3. Automatic generation of n and k curves

4. Ellipsometric parameters (including Δ) and related output formats

5. User-friendly, extensible material database; includes common application model fitting

6. File output formats include .txt, Excel, and standard formats used for quality control

 

5. Product Configuration List

5.1 Standard Configuration Delivery List

Item Name

Quantity

Full-spectrum ellipsometer (including main instrument unit, integrated control system, and sample stage)

1 unit

Xenon lamp light source (including light source housing, xenon lamp controller, and xenon lamp bulb)

1 set

Optical fiber

2 pieces

Spectrometer

1 unit

Control computer (including keyboard, mouse, and monitor)

1 set

Ellipsometry testing software

1 copy

Certificate of conformity

1 copy

Nanofilm wafer sample (100 nm silicon dioxide on silicon (SiO2/Si))

1 piece

User manual

1 copy

Factory inspection report for the complete system

1 copy

 

5.2 List of Optional Configurations

Item Name

Specification

Nanofilm wafer sample (Si3N4/Si)

4 inches", 100nm

Vacuum pump

FUJ-V3

Spare optical fiber

FF-UV800-22

Spare light source bulb

FF-UV150W-200

UPS power supply

FF-HT-11

CATEGORIES

CONTACT US

Contact: Minder Hu

Phone: 0086-15813334038

Tel: 020-84789496

Email: md@minder-hightech.com

Add: 813,No.43,Xinshuikeng Section, Shixin Road, Dalong street,Panyu District,Guangzhou. Zip:511442