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Sputtering coater

  • Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C
  • Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C
  • Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C
  • Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C
  • Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C
Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C

Magnetron Ion Sputtering and Thermal Evaporation Carbon Coater - SD900C

  • SD900C
  • Product description: Sputtering Coater
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Magnetron Ion Sputtering + Thermal Evaporation Carbon

Coater - SD900C Model


We supplies / offers a Magnetron Ion Sputtering Unit + Thermal Evaporation Carbon Unit (SD900C Model) that is ideal and designed for lab SEM sample preparation. SD900C Model (Magnetron Ion Sputtering Unit) is widely used to coat non-conductive or heat-sensitive SEM samples with Au for better imaging. It is also excellent for surface treatment and avoids damage to the substrate sample.


SD900C Model (Thermal Evaporation Carbon Unit) carbon coater applies a thin conductive carbon film on a sample surface. Applying this coating to a non-conductive sample is an effective preparation technique for diminishing charge-up electron artifacts for analysis in a SEM.


Working vacuum pressure can be achieved quickly when using proper vacuum pump within 5 minutes. It is user friendly and easy to operate.


Vacuum pump is included.

Chiller is optional. (for Magnetron Ion Sputtering Unit)

Technical Specifications

Vacuum Pump Set

(Oil required) Rotary Vacuum Pump

Rotary Pumping Speed

50 Hz : 8 m3/h(2.2 L/s) / 60Hz : 9.6m3/h (2.6 L/s)

Vacuum Limit

2 Pa

Max Sputtering Current

100 mA

Max Evaporation Current

100A

Sputtering Working Pressure

20Pa-8Pa

Working Vacuuming Time

6Pa-4Pa

Vacuum Measure

<5 Min(2 Pa)

Gas Control

Measuring range from atmosphere to 2*10-2mbar

Chamber Size

Gas Flow Controller

Magnetron Target Source

φ150* 120mm (height)Scratch Resistant Quartz Glass

Evaporation Target Source

Target size φ 50*0.1mm (Au) / Target source:Au, Ag,Pt

Operation Method

Target material: Carbon Rope / Target source: Carbon Rope

 (2 Units) Weight / (1 Unit)Size

55kg / 360mm length * 300mm wide * 380mm high

Power Supply

AC 110V 60Hz or AC 220V 50Hz

Power Consumption

<200ow

Cooling Method

Air Cooling (Evaporation) + Water Cooling (Sputtering)

Warranty

One year limited warranty with lifetime product support

CATEGORIES

CONTACT US

Contact: Minder Hu

Phone: 0086-15813334038

Tel: 020-84789496

Email: md@minder-hightech.com

Add: 813,No.43,Xinshuikeng Section, Shixin Road, Dalong street,Panyu District,Guangzhou. Zip:511442