Lithography Solution

DMD Maskless lithography machine desktop version

MDZY-DMD-MLL200-Desktop
Product description: DMD Maskless lithography machine
INQUIRY

introduction

The MDZY-DMD-MLL200 is a maskless lithography machine based on DMD (Digital Micromirror Device) technology. By replacing traditional masks with a DMD, it allows for rapid and flexible design of lithographic patterns, supporting 2D and 8-bit grayscale lithography. It can meet any micron-scale lithography requirements and is widely used in various fields such as MEMS and microfluidics.

Features

1. Compact desktop design

2. High-power, high-uniformity LED exposure light source

3. Green light guided exposure

4. Automatic image focusing using a CCD camera

5. High-precision linear motor stage

6. Easy-to-use software interface

Parameters

UV light source center wavelength	405nm
Exposure uniformity	More than 90%
Minimum feature linewidth	0.5um
Single-pass writing field exposure area	0.16*0.16mm (@0.5um)
Writing speed	80 mm²/min (1um feature line width)
Supported image formats	DXF, GDS, bmp, png, etc.

Configuration

Configuration	Basic version	Professional version
Light source	High-power LED: 405nm
DMD chip	DLP6500
Single-field exposure area	0.160.16mm (@0.5um), 0.40.4mm (@0.7um), 0.80.8mm (@1um), 1.61.6mm (@2um)
Camera	Large-area microscope camera (supports size measurement)
Minimum equidistant line width	0.8 µm	0.5μm
Stitching accuracy	±0.3 µm	±0.3μm
Overlay accuracy	±0.5 µm	±0.5μm
Writing speed	20 mm²/min (1 µm feature linewidth)	80 mm²/min (1μm feature linewidth)
Motion stage	High-precision linear motor (repeatable positioning accuracy ±0.25µm), leveling mechanism, manual rotary stage	High-precision linear motor (repeatable positioning accuracy ±0.25µm), leveling mechanism, electric rotary stage
Objective lens changer	Manual objective lens switching	Motorized objective lens switching
Focusing module	CCD image autofocus	Laser active focusing
Supported wafer sizes	4 inch	4-inch/8-inch
Sample thickness	0-10mm	0-10 mm