MDPS-560 Pyriform Double Chamber Sputtering System

Type

MDPS-560 II

Main Sputtering Chamber

pyriform vacuum chamber, size:Φ560×350mm

Sample Injection Chamber

cylindrical and horizontal type, size: Φ250mm×420mm

Pumping System

independent compound molecular pump and mechanical pump set for main sputtering chamber and sample injection chamber.

Ultimate Vacuum

Main Sputtering Chamber

≤6.67×10-6Pa(after baking and degassing)

Sample Injection Chamber

≤6.67×10-4Pa(after baking and degassing)

Regain Vacuum Time

Main Sputtering Chamber

6.6×10-4Pa after 40 min.(pumping after short-time exposed to air and filled with dry nitrogen)

Sample Injection Chamber

6.6×10-3Pa after 40 min.(pumping after short-time exposed to air and filled with dry nitrogen)

Magnetron Target Module

5 permanent magnet targets; sizeΦ60mm(one of the targets can sputtering ferromagnetic material).All the targets can RF sputtering and DC sputtering compatibly; and the distance between target and sample adjustable from 40mm to 80mm.

Water-cooling Substrate Heating Revolution Table

Substrate Structure

Six stations, heating furnace installed at one station, and the others are water cooling substrate station.

Size

Φ30mm, six pics.

Mode of motion

0-360°,reciprocate.

Heating

Max. Temperature 600℃±1℃

Substrate Negative  Bias

-200V

Gas Circuit System

2-way Mass Flow Controller(MFC)

Sample Injection Chamber

Sample Chamber

Six simples one time

Annealer

Max. heating temperature  800℃±1℃

Resputtering Target Module

Resputtering cleaning

Magnet Sample Send System

Used for sample transporting between sputtering chamber and sample injection chamber.

Computer Control System

Sample rotation, baffle open and shut, and target position control

Floor Occupied

Main Set

2600×900mm2

Electrical Cabinet

700×700mm2(two sets)